| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device capable of easily controlling and setting the appropriate state of a multi-pole magnetic field depending on types of processes of plasma treatment to perform desired treatment easily. <P>SOLUTION: A magnetic-field forming mechanism is constituted of an upper magnetic-field forming mechanism 22a and a lower magnetic-field forming mechanism 22b both of which are provided separately and vertically, and the upper magnetic-field forming mechanism and the lower magnetic-field forming mechanism are constituted so as to be vertically movable to approximate and separate from each other. <P>COPYRIGHT: (C)2011,JPO&INPIT |
