发明名称 ELECTROPLATING APPARATUS
摘要 An electroplating apparatus includes an electroplating tank, a first supporting bar, a first holding element, two second supporting bars, a number of spaced crossbars, a number of second holding elements, and a power supply. The first holding element is suspended in the tank from the first supporting bar, and the first holding element is configured for holding a plate-shaped workpiece in a manner that the workpiece is oriented along the first supporting bar. The second holding elements are suspended from the corresponding crossbars, each of the second holding elements arranged between the first and one of the second supporting bars and configured for holding a metal block. The power supply includes a cathode for electrical connection to the workpiece through the first supporting bar and the first holding element and an anode for electrically connection to the metal blocks through the second supporting bars and the second holding elements.
申请公布号 US2011233052(A1) 申请公布日期 2011.09.29
申请号 US20100913782 申请日期 2010.10.28
申请人 FOXCONN ADVANCED TECHNOLOGY INC. 发明人 CHENG CHIEN-PANG
分类号 C25D17/04 主分类号 C25D17/04
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