发明名称 |
PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM |
摘要 |
<p>A pattern forming method comprising (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the resist composition contains (A) a resin capable of increasing the polarity to decrease the solubility for an organic solvent-containing developer by the action of an acid, (B) at least one kind of a compound capable of generating a sulfonic acid represented by the specific formula upon irradiation with an actinic ray or radiation, and (C) a solvent.</p> |
申请公布号 |
WO2011118824(A1) |
申请公布日期 |
2011.09.29 |
申请号 |
WO2011JP57499 |
申请日期 |
2011.03.18 |
申请人 |
FUJIFILM CORPORATION;FUJII, KANA;TARUTANI, SHINJI |
发明人 |
FUJII, KANA;TARUTANI, SHINJI |
分类号 |
G03F7/004;G03F7/038;G03F7/039;G03F7/32;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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