发明名称 LITHOGRAPHIC PROCESSING SOLUTIONS AND METHODS OF USE
摘要 <p>A lithographic processing solution having a pH of less than 12 and comprising at least 0.001 and up to and including 1 weight % of a water-soluble or water-dispersible, non-IR-sensitive compound that has a heterocyclic moiety with a quaternary nitrogen in the 1 -position of the heterocyclic ring, and having one or more electron donating substituents attached to the heterocyclic ring, at least one of which electron donating substituents is attached in the 2-position. The processing solution can be used to develop multi-layer positive-working lithographic printing plate precursors that have been imaged using infrared radiation.</p>
申请公布号 WO2011119342(A1) 申请公布日期 2011.09.29
申请号 WO2011US27864 申请日期 2011.03.10
申请人 EASTMAN KODAK COMPANY;SAVARIAR-HAUCK, CELIN;HAUCK, GERHARD;NAKASH, MOSHE 发明人 SAVARIAR-HAUCK, CELIN;HAUCK, GERHARD;NAKASH, MOSHE
分类号 B41C1/10;B41N3/08 主分类号 B41C1/10
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