RESIST COMPOSITION ARRANGEMENT DEVICE AND METHOD OF MANUFACTURING PATTERN FORM

摘要

PROBLEM TO BE SOLVED: To improve an imprint transfer shape and variance in residue thickness after imprinting by stabilizing a discharge when discretely arranging a resist composition using an inkjet method. SOLUTION: A resist composition arrangement device that discretely arranges the resist composition to be used for the imprinting method on a substrate includes: a polymer content storage means of storing a polymer content of the resist composition; a resist discharging means of discharging the resist composition from a nozzle; and a driving waveform-adjusting means of changing a driving waveform for discharging the resist composition from the nozzle according to the polymer content. COPYRIGHT: (C)2011,JPO&INPIT