COMPOUNDS HAVING PHENOL SUBSTITUENTS, PROCESS FOR PRODUCING THE COMPOUND, AND RESIST COMPOSITION COMPRISING THE COMPOUND

摘要

There are provided a novel compound having a phenol substituent representedby the following formula (1), a method for producing the compound, and a resist composition containing the compound.[Formula 1][err] wherein R[err] to R[err] and n[err] are as defined in the detailed description of the invention. Thesubstituent represented by the formula (I) contains an acid-dissociable functional group.The compound having the phenol substituent represented by the formula (1) constitutes a resist composition together with a photoacid generator, and thereby provides a resist composition which is excellent in sensitivity, resolution and line edge roughness,and is capable of drawing ultrafine patterns.