发明名称 MAGNETIC FIELD IMMERSION TYPE ELECTRON GUN AND ELECTRON BEAM APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To achieve a reduced size of a magnetic path and stable behavior of an electron gun in a double-gap magnetic field immersion type electron gun. <P>SOLUTION: The magnetic field immersion type electron gun has a double-gap magnetic path with three magnetic poles arranged on a coaxial line in which a magnetic lens has a hole in its central axis, wherein a permanent magnet is arranged in a gap of two gaps made up among the three magnetic poles, the gap on the side where there exists no electron source. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011192732(A) 申请公布日期 2011.09.29
申请号 JP20100056095 申请日期 2010.03.12
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 ONISHI TAKASHI;WATANABE SHUNICHI;TAMURA KEIJI;ICHIHASHI MIKIO
分类号 H01L21/027 主分类号 H01L21/027
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