发明名称 SEMICONDUCTOR DEVICE PROVIDED WITH TIN DIFFUSION INHIBITING LAYER, AND MANUFACTURING METHOD OF THE SAME
摘要 A semiconductor device is disclosed wherein a tin diffusion inhibiting layer is provided above the land of a wiring line, and a solder ball is provided above the tin diffusion inhibiting layer. Thus, even when this semiconductor device is, for example, a power supply IC which deals with a high current, the presence of the tin diffusion inhibiting layer makes it possible to more inhibit the diffusion of tin in the solder ball into the wiring line.
申请公布号 US2011233769(A1) 申请公布日期 2011.09.29
申请号 US201113069771 申请日期 2011.03.23
申请人 CASIO COMPUTER CO., LTD. 发明人 JOBETTO HIROYASU
分类号 H01L23/485;H01L21/441 主分类号 H01L23/485
代理机构 代理人
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