HYBRID VACUUM DEPOSITION DEVICE

摘要

A hybrid vacuum deposition device comprises a vacuum chamber (4), a cathode electric arc evaporating source (2), an intermediate frequency magnetron sputtering source (7), a DC magnetron sputtering source (8), a reaction gas ion source (10) and a work-piece bracket (3). Working gas enters the vacuum chamber (4) through gas intake pipes (6) set near the intermediate frequency magnetron sputtering source (7) and the DC magnetron sputtering source (8). Through optimal arrangement of said components, the gas concentration near the intermediate frequency magnetron sputtering source (7) and the DC magnetron sputtering source (8) is lower than that near the cathode electric arc evaporating source (2). Thus the advantages of each film forming source are exerted and the film faults are restrained.