OPTICAL SYSTEM, EXPOSURE APPARATUS, AND WAVERFRONT CORRECTION METHOD

摘要

An optical system (20) of a microlithographic projection exposure apparatus includes a wavefront correction device (26) which has a plurality of fluid outlet apertures (44). The apertures are arranged such that fluid flows (48, 50) emerging from the outlet apertures (44) enter a space through which projection light propagates during operation of the apparatus (10). A temperature controller (60) sets the temperature of the fluid flows (48, 50) individually for each fluid flow. The temperature distribution is determined such that optical path length differences caused by the temperature distribution correct wavefront deformations.