| 摘要 |
PROBLEM TO BE SOLVED: To provide a supercritical drying method and a supercritical drying device that can efficiently and reliably achieve supercritical drying using supercritical carbon dioxide. SOLUTION: The supercritical drying method includes: a first step of cleaning a substrate, having a plurality of adjoining patterns on one surface, with cleaning solution; a second step of replacing the cleaning solution on the substrate with replacement solution; a third step of removing, in a liquid state, a part of the replacement solution on the substrate so that the replacement solution remains between the plurality of patterns, with inert gas with conditions in which the replacement solution does not vaporize; a fourth step of holding the substrate in supercritical fluid and replacing the replacement solution between the plurality of patterns with supercritical fluid; and a fifth step of vaporizing the supercritical fluid adhering to the substrate. COPYRIGHT: (C)2011,JPO&INPIT
|
