发明名称 DEVELOPMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a development apparatus which reduces the amount of cooling water used for controlling the temperature of developer. SOLUTION: The development apparatus includes a receiving portion into which an exposure-processed glass substrate is carried; a developing tank which performs a development processing; a water displacement tank for removing the developer remaining in the glass substrate; a cleaning tank which performs cleaning processing of the glass substrate; and a carry-out portion which carries out the cleaning-processed glass substrate. The apparatus further includes a developer storage tank which stores the developer to be supplied to the developing tank; a pure water storage tank which stores a cleaning water; a supply system which supplies the cleaning water to the cleaning tank from the pure water storage tank; a drainage system of the cleaning water which drains away the cleaning water from the cleaning tank; a warming means which warms the developer in the developer storage tank; and a circulation cooling system which cools the developer in the developer storage tank by circulating the cooling water, and moreover, the development apparatus includes a path for cooling the developer therein via the developer storage tank, in both or one of the supply system of the cleaning water or the drainage system of the cleaning water. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011192775(A) 申请公布日期 2011.09.29
申请号 JP20100057184 申请日期 2010.03.15
申请人 TOPPAN PRINTING CO LTD 发明人 TAKAHASHI HIDETOSHI
分类号 H01L21/027 主分类号 H01L21/027
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