发明名称 GAS BARRIER FILM AND DEVICE
摘要 Disclosed is a gas barrier film comprising a substrate film, an organic layer and an inorganic layer provided directly on the surface of the organic layer, wherein the organic layer laid under the inorganic layer has a thickness of from 0.3μm to 10μm; the organic layer laid under the inorganic layer has a hardness, measured by the nanoindentation, of 0.03 to 0.5 GPa; and the organic layer laid under the inorganic layer, assumed to have a thickness“a”, and the inorganic layer on the organic layer, assumed to have a thickness“b”, satisfying a relation of a/b>10. The gas barrier film is excellent in the barrier performance, adhesiveness, bending resistance and scratch resistance.
申请公布号 US2011236660(A1) 申请公布日期 2011.09.29
申请号 US201113070949 申请日期 2011.03.24
申请人 MURAKAMI TOMOO 发明人 MURAKAMI TOMOO
分类号 B32B7/02 主分类号 B32B7/02
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