发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor device includes a first bump that is located over a surface of a semiconductor element, and is formed on a first bump formation face distanced from a back surface of the semiconductor element at a first distance, and a second bump that is located over the surface of the semiconductor element, and is formed on a second bump formation face distanced from the back surface of the semiconductor element at a second distance being longer than the first distance, the second bump having a diameter larger than a diameter of the first bump.
申请公布号 US2011233765(A1) 申请公布日期 2011.09.29
申请号 US201113028419 申请日期 2011.02.16
申请人 FUJITSU LIMITED;FUJITSU TEN LIMITED 发明人 TANI MOTOAKI;IIJIMA SHINYA;SUGIURA SHINICHI;WATANABE HIROMICHI
分类号 H01L23/48;H01L21/52 主分类号 H01L23/48
代理机构 代理人
主权项
地址