发明名称 METHOD FOR MANUFACTURING SUBSTRATE
摘要 <p>The present invention relates to a method for manufacturing a substrate that provides a uniform roughness to the rear face of the substrate using sand blasting. The method for manufacturing a substrate according to the present invention comprises: a slicing step for slicing an ingot in a wafer-shape; a sand blasting step for sand blasting at least one of the two faces of the substrate that has been sliced in a wafer-shape; a lapping step for lapping the two faces of the substrate, the lapping step being carried out between the slicing step and the sand blasting step; a heat treating step for heat treating the sand-blasted substrate; and a polishing step for mirror polishing the front face of the heat-treated substrate.</p>
申请公布号 WO2011118865(A1) 申请公布日期 2011.09.29
申请号 WO2010KR01880 申请日期 2010.03.26
申请人 CRYSTAL-ON CO., LTD.;KANG, JIN-KI;MA, JAE-YOUNG;PARK, HONG-JIN;LEE, KYOUNG-HO 发明人 KANG, JIN-KI;MA, JAE-YOUNG;PARK, HONG-JIN;LEE, KYOUNG-HO
分类号 H01L33/20;H01L21/20;H01L21/302;H01L33/22 主分类号 H01L33/20
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