INDUCTIVELY-COUPLED PLASMA (ICP) RESONANT SOURCE ELEMENT
摘要
The present invention generally relates to an inductive-capacitive element that may be used to form a single coil within an inductively-coupled plasma apparatus. One or more elements may be used and coupled together to collectively form the coil. The coil may be coupled to a single match network. Therefore, a single input and a single output may be used for the coil so that fewer penetrations through the chamber walls may be used. The individual inductive-capacitive elements may comprise two overlapping tubes with an insulating material disposed therebetween in an overlapping area. The overlapping area forms a capacitor segment and the non-overlapping area forms an inductor segment. The tubes and insulating material may be welded together to create a resonant circuit with an impedance of zero. Thus, the inductance of the coil is low, only two wall penetrations are utilized and a single match network is utilized.
申请公布号
WO2011041087(A3)
申请公布日期
2011.09.29
申请号
WO2010US48573
申请日期
2010.09.13
申请人
APPLIED MATERIALS, INC.;WHITE, JOHN M.;BAEK, JONGHOON;TANAKA, TSUTOMU (TOM)
发明人
WHITE, JOHN M.;BAEK, JONGHOON;TANAKA, TSUTOMU (TOM)