| 摘要 |
<p>Laser annealing and test for unevenness in emission are conducted at the same time, and the laser annealing is interrupted when unevenness in emission is detected. When unevenness in emission is detected, a laser optical system can be adjusted immediately, and unevenness in emission can be prevented from occurring in substrates subsequent to the substrate in which unevenness in emission occurred. Since the test for unevenness in emission is finished slightly after the completion of the laser annealing, processing of the next substrate starts with little delay when unevenness in emission does not occur.</p> |
