发明名称 MOLD FOR NANOIMPRINT
摘要 A mold for nanoimprint including a liquid-crystalline polysilane and having a raised and recessed surface formed by the formation of a smectic phase due to the orientation of the liquid-crystalline polysilane.
申请公布号 US2011233820(A1) 申请公布日期 2011.09.29
申请号 US200913120720 申请日期 2009.09.24
申请人 TOKYO INSTITUTE OF TECHNOLOGY;JX NIPPON OIL & ENERGY CORPORATION 发明人 WATANABE JUNJI;NISHIMURA SUZUSHI;SEKI TAKASHI;HIRAI TOMOO
分类号 B29C59/02 主分类号 B29C59/02
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