| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition with which a pattern having an excellent focus margin can be obtained. <P>SOLUTION: The resist composition includes: a sulfonium salt containing an anion repressed by formula (IA); an acrylic resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of acid; and an acid generator. R<SP>1</SP>and R<SP>2</SP>independently represent a hydrogen atom, an aliphatic hydrocarbon group, a saturated cyclic hydrocarbon group, an aromatic hydrocarbon group or an aralkyl group, and the hydrogen atom contained in the aliphatic hydrocarbon group, the saturated cyclic hydrocarbon group, the aromatic hydrocarbon group and the aralkyl group may be replaced bya hydroxyl group, a nitrile group, a fluorine atom, a trifluoromethyl group or a nitro group, and -CH<SB>2</SB>- contained in the aliphatic hydrocarbon group may be replaced by -O- or -CO-, and R<SP>1</SP>and R<SP>2</SP>may be bonded each other to form a ring together with N. <P>COPYRIGHT: (C)2011,JPO&INPIT |
