发明名称 RESIN AND PHOTORESIST COMPOSITION CONTAINING THE SAME
摘要 The present invention provides a resin obtained by reacting a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a C1-C6 alkyl group, R2, R3 and R4 each independently represents a C1-C6 alkyl group and R1, R2, R3, R4 and A1 are bonded to form a ring, A1 represents a C1-C20 saturated hydrocarbon group in which one or more —CH2— can be replaced by —O—, B1 and B2 each independently represent a C1-C6 alkylene group, L1 and L2 each independently represent a halogen atom, —O—CH═CH2, —O—CH═CH(CH3) or —O—SO2—R′ in which R′ represents a C1-C6 alkyl group or a C6-C20 aryl group, with a polyhydric phenol compound.
申请公布号 US2011236827(A1) 申请公布日期 2011.09.29
申请号 US201113070190 申请日期 2011.03.23
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 TAKEMOTO ICHIKI;ANDO NOBUO
分类号 G03F7/004;C07C69/734;C07C309/64;C07C309/72;C08G63/12;C08G63/78 主分类号 G03F7/004
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