发明名称 EVALUATING DEVICE AND EVALUATING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an evaluating device capable of making precise evaluation to determine whether a subject to be processed can be processed into a desired shape using a formed resist pattern. <P>SOLUTION: The evaluating device includes a resist pattern data obtaining unit 33 which obtains resist pattern data having a plurality of feature quantities including at least two of feature quantities of a hole diameter and an aspect ratio based on a given signal threshold measured on a hole forming pattern in resist patterns formed on a subject to be processed and a difference between hole diameters based on a plurality of signal thresholds, and an evaluating unit 34 which substitutes the obtained resist pattern data in an evaluation function parameter containing the plurality of feature quantities as parameters and evaluating the presence/absence of a possibility that a hole pattern formed on the subject to be processed using the hole forming pattern remains unopened, calculates an evaluation value on the hole forming pattern, and then evaluates the presence/absence of the possibility that the hole pattern formed on the subject to be processed remains unopened based on the evaluation value. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011192837(A) 申请公布日期 2011.09.29
申请号 JP20100058303 申请日期 2010.03.15
申请人 TOSHIBA CORP 发明人 MITSUYOSHI YASURO;ABE HIDEAKI;SANHONGI SHOJI;TAKAHATA KAZUHIRO;ASANO MASASHI;KOJIMA TOMOKO;KAJIWARA SEIKI
分类号 H01L21/027 主分类号 H01L21/027
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