| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having good resolution performance and being excellent particularly in property of uniformly forming a resist pattern and in mask reproducibility, and to provide a polymer suitably used in the radiation-sensitive resin composition. <P>SOLUTION: The radiation-sensitive resin composition comprises [A] a polymer having a structural unit (1) represented by formula (1) and a structural unit (2) containing a cyclic carbonate structure, and [B] a radiation-sensitive acid generator, wherein R<SP>1</SP>is H or methyl. <P>COPYRIGHT: (C)2011,JPO&INPIT |
