| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a detector with high signal stability. <P>SOLUTION: There is provided the lithographic apparatus equipped with: an illumination system for providing a beam of radiation; a support structure for supporting patterning device, the patterning device serving to impart the radiation beam with a pattern in its cross-section; a substrate table for holding a substrate; and a detector configured to measure a property of the beam of radiation, the detector comprising first and second luminescent uniaxial crystals each having an optic axis, the optic axis of the first uniaxial crystal being arranged such that it is substantially perpendicular to the optic axis of the second uniaxial crystal. <P>COPYRIGHT: (C)2011,JPO&INPIT |
