DEVICE AND METHOD FOR INSPECTION

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor inspection device and a defect inspection method that efficiently adjusts a plurality of secondary electron beams. SOLUTION: The inspection device is equipped with: an irradiation optical system to irradiate an object to be inspected with a plurality of irradiating lights; a detection optical system that is irradiated by the irradiation optical system to detect the plurality of lights emitted from the object to be inspected; a comparison section to compare a signal strength based on a plurality of lights detected by the detection optical system; and an arithmetic processing section having a correction amount calculation section to calculate a displacement between each position of a plurality of lights and each detection position of a plurality of lights that are detected by the detection optical system based on the result of comparison by the comparison section and a processing section that processes signals based on the plurality of lights to inspect the object to be inspected. The detection optical system also has a control section to adjust the irradiation optical system based on the displacement calculated by the correction amount calculation section. COPYRIGHT: (C)2011,JPO&INPIT