发明名称 HIGH PURITY TANTALUM AND PRODUCT CONTAINING THE SAME LIKE SPUTTER TARGET
摘要 PROBLEM TO BE SOLVED: To meet a need to have a tantalum product having higher purity, a fine grain size, and/or a uniform texture. SOLUTION: High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99.995% and more preferably at least 99.999%. In addition, tantalum metal and alloys thereof are described, which either have a grain size of about 50μor less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 15 random, or an incremental log ratio of (111):(100) intensity of greater than about -4.0, or any combination of these properties. Also articles and components made from the tantalum metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like are described. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011190537(A) 申请公布日期 2011.09.29
申请号 JP20110080406 申请日期 2011.03.31
申请人 CABOT CORP 发明人 MICHALUK CHRISTOPHER A;MAGUIRE JAMES D JR;KAWCHAK MARK N;HUBER LOUIS E JR
分类号 C22C27/02;B22D27/02;B22F9/24;C22B3/44;C22B9/04;C22B9/20;C22B9/22;C22B34/24;C22F1/00;C22F1/18;C23C14/34 主分类号 C22C27/02
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