发明名称 Methods of Manufacturing Stacked Semiconductor Devices
摘要 A stacked semiconductor device that is reliable by forming an insulating layer on a lower memory layer and by forming a single crystalline semiconductor in portions of the insulating layer. A method of manufacturing the stacked semiconductor device, including: providing a lower memory layer including a plurality of lower memory structures; forming an insulating layer on the lower memory layer; forming trenches by removing portions of the insulating layer; forming a preparatory semiconductor layer for filling the trenches; and forming a single crystalline semiconductor layer by phase-changing the preparatory semiconductor layer.
申请公布号 US2011237055(A1) 申请公布日期 2011.09.29
申请号 US201113053291 申请日期 2011.03.22
申请人 SON YONG-HOON;CHOI SI-YOUNG;LEE MYOUNG-BUM;HWANG KI-HYUN;BAIK SEUNG-JAE;HAN JEONG HEE 发明人 SON YONG-HOON;CHOI SI-YOUNG;LEE MYOUNG-BUM;HWANG KI-HYUN;BAIK SEUNG-JAE;HAN JEONG HEE
分类号 H01L21/20 主分类号 H01L21/20
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