发明名称 TEMPLATE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE TEMPLATE
摘要 According to one embodiment, there is provided a template which includes a first region and a second region. The first region is provided with a first pattern of a plurality of recessed portions formed on a main surface of the template, and has a first thickness. The second region is provided with a second pattern of a plurality of recessed portions formed on the main surface of the template, and has a second thickness different from the first thickness. The second pattern is different from the first pattern in at least one of interval and dimension of the recessed portions.
申请公布号 US2011237086(A1) 申请公布日期 2011.09.29
申请号 US201113024932 申请日期 2011.02.10
申请人 YONEDA IKUO 发明人 YONEDA IKUO
分类号 H01L21/31;B32B3/30;C23F1/04 主分类号 H01L21/31
代理机构 代理人
主权项
地址