| 摘要 |
<p>Disclosed are an irregular-surface forming method that uses a plasma-etching process by which a substrate having a predetermined irregular surface is stably and precisely attained; and an electrode member attained by such a forming method. When implementing the plasma-etching process, the irregular-surface forming method includes a fine, irregular surface, and forms a predetermined irregular-surface pattern on a substrate, using a partially oxidized metallic salt film as a resistor. The method includes a first process that coats a liquid material containing metallic salt to form a metallic salt film on a substrate; a second process that forms a fine, irregular surface on the metallic-salt film, and partially oxidizes for resistivity; and a third process that forms on the substrate, along with resist, a predetermined irregular surface using a plasma-etching process on the substrate.</p> |
