发明名称 METHOD FOR MANUFACTURING PATTERN FILM FORMING MEMBER
摘要 PROBLEM TO BE SOLVED: To prevent a contact of mutual adjacent pattern films by setting the width of a first hitting prohibited area in a moving direction of a droplet discharge head more widely than the width of a second hitting prohibited area in the moving direction of the droplet discharge head. SOLUTION: The method includes: a droplet hitting area setting process of setting a hitting allowed area allowing the hitting of the droplet and a hitting prohibited area prohibiting the hitting of the droplet among pattern film forming areas partitioned by a partition part formed on a substrate; and a functional fluid applying process of discharging a functional fluid containing materials of the pattern film as a droplet toward the hitting allowed area while moving the droplet discharge head to the substrate and coating the pattern film forming area with the functional fluid. In the droplet hitting area setting process, the first hitting prohibited area at the moving direction side of the liquid droplet head to the hitting allowed area and the second hitting prohibited area of the opposite side of the moving direction of the droplet discharge head to the hitting allowed area are set, and at the same time, the first hitting prohibited area is to be set more widely than the second hitting prohibited area. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011189267(A) 申请公布日期 2011.09.29
申请号 JP20100057136 申请日期 2010.03.15
申请人 SEIKO EPSON CORP 发明人 IWATA YUJI;KATO TAKESHI;SAKAI HIROBUMI
分类号 B05D1/26;B05D3/00;G02B5/20 主分类号 B05D1/26
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