| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide substrate treatment equipment and a method in which a liquid film can be frozen surely while preventing it from drying up. Ž<P>SOLUTION: Gas introduction piping 33 is connected with a cooling gas ejection nozzle 3 and cooling gas can be introduced from the gas introduction piping 33 to a circulation space S1 formed in the cooling gas ejection nozzle 3. The cross-section CS1 of the circulation space S1 in the surface direction in the plane of the substrate surface Wf has an area larger than that of the channel cross-section CS2 of the gas introduction piping 33. Consequently, the flow velocity of the cooling gas introduced into the circulation space S1 and circulating the circulation space S1 becomes lower than that of the cooling gas circulating the gas introduction piping 33. Consequently, the flow velocity of the cooling gas can be decelerated in the nozzle even if the flow velocity of the cooling gas circulating the gas introduction piping 33 is increased. Ž<P>COPYRIGHT: (C)2008,JPO&INPIT Ž</p> |
