| 摘要 |
A system to form a thin-film phosphor layer on a substrate, the system comprising a deposition subsystem defining an enclosure to accommodate the substrate; a phosphor powder delivery subsystem configured to deliver, using a carrier gas, a phosphor powder from a source of the phosphor powder to the deposition subsystem; a polymer precursor delivery subsystem configured to deliver polymer precursors in a vapor phase to the deposition subsystem; and a control subsystem connected to the deposition subsystem, the phosphor powder delivery subsystem, and the polymer precursor delivery subsystem, wherein the control subsystem is configured to control the phosphor powder delivery subsystem to deliver the phosphor powder to the deposition subsystem for a first time interval to form a phosphor powder layer adjacent to the substrate, and the control subsystem is configured to control the polymer precursor delivery subsystem to deliver the polymer precursors to the deposition subsystem for a second time interval to form a polymer layer adjacent to the phosphor powder layer. |
