发明名称 Second Schottky contact metal layer to improve GaN Schottky diode performance
摘要 A Schottky contact is disposed atop a surface of a semiconductor. A first Schottky contact metal layer is disposed atop a first portion of the semiconductor surface. A second Schottky contact metal is disposed atop a second portion of the surface layer and adjoins the first Schottky contact metal layer. The first Schottky contact metal layer has a lower work function than the second Schottky contact metal layer.
申请公布号 US8026568(B2) 申请公布日期 2011.09.27
申请号 US20060589124 申请日期 2006.10.27
申请人 VELOX SEMICONDUCTOR CORPORATION 发明人 ZHU TING GANG;PABISZ MAREK
分类号 H01L31/07;H01L21/338 主分类号 H01L31/07
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