发明名称 Semiconductor apparatus having a triple well structure and manfacturing method thereof
摘要 A semiconductor apparatus according to the present invention includes a first well-region and a second well-region in a semiconductor substrate, and a plurality of transistors formed to the second well-region. Further, the semiconductor apparatus includes a through-hole region that is formed so as to pierce through the first well-region and enables the second well-region to be electrically conductive to the semiconductor substrate on the bottom of the second well. Furthermore, in the semiconductor apparatus, the border of the through-hole region is arranged between the transistors, and is also arranged to be planarity apart from the transistor.
申请公布号 US8026577(B2) 申请公布日期 2011.09.27
申请号 US20080068914 申请日期 2008.02.13
申请人 FUJITSU SEMICONDUCTOR LIMITED 发明人 TANAKA TAKUJI
分类号 H01L29/40;H01L21/44 主分类号 H01L29/40
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