发明名称 Lithographic apparatus and device manufacturing method
摘要 A method including mixing using a mixer a first component and a second component to form a liquid before supply to a space between the projection system and a substrate, measuring a property of the liquid using a measuring device and making the feedback available to a controller, based on the feedback, controlling with the controller a physical property of the liquid by controlling the amount of the first and/or second component used to form the liquid, supplying the liquid to the space between the projection system and the substrate, and projecting a patterned beam of radiation, using the projection system, through the liquid onto a target portion of the substrate.
申请公布号 US8027026(B2) 申请公布日期 2011.09.27
申请号 US201113016211 申请日期 2011.01.28
申请人 ASML NETHERLANDS B.V.;ASML HOLDING N.V. 发明人 LIPSON MATTHEW;DIERICHS MARCEL MATHIJS THEODORE MARIE;DONDERS SJOERD NICOLAAS LAMBERTUS;MULKENS JOHANNES CATHARINUS HUBERTUS;STREEFKERK BOB;WILKLOW RONALD;DE JONGE ROEL
分类号 G03B27/54 主分类号 G03B27/54
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