发明名称 Through-silicon via structures including conductive protective layers
摘要 Through-Silicon-Via (TSV) structures can include a conductive via through a substrate extending from an upper surface of the substrate to a backside surface of the substrate opposite the upper surface, a conductive protective layer including Ni and/or Co can be at a bottom of the conductive via, and a separate polymer insulating layer can be on the backside surface of the substrate in contact with the conductive protective layer.
申请公布号 US8026592(B2) 申请公布日期 2011.09.27
申请号 US20090408369 申请日期 2009.03.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 YOON MINSEUNG;KIM NAMSEOG;KIM PYOUNGWAN;MA KEUMHEE;JO CHAJEA
分类号 H01L23/04 主分类号 H01L23/04
代理机构 代理人
主权项
地址