发明名称 Radiation-sensitive resin composition
摘要 A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern. wherein R1 represents a hydrogen atom or the like, M+ represents a specific cation, and n represents an integer from 1 to 5.
申请公布号 US8026039(B2) 申请公布日期 2011.09.27
申请号 US20070514212 申请日期 2007.11.09
申请人 JSR CORPORATION 发明人 NAGAI TOMOKI;EBATA TAKUMA;SHIMIZU MAKOTO
分类号 G03F7/004 主分类号 G03F7/004
代理机构 代理人
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