DEVICE FOR FAST AND UNIFORM HEATING OF A SUBSTRATE WITH INFRARED RADIATION

摘要

The invention concerns a heating device comprising infrared radiation lamps (24, 26) for providing a fast heat treatment of a substrate (12) inside a reaction chamber (14) with transparent window (34). The infrared lamps (24, 26) are distributed on two superimposed stages (A, B) extending on a common side of the substrate (12), the lamps (24) of the lower stage (A) being arranged perpendicular relative to the lamps (26) of the upper stage (B). Means adjusting power input for each unit of lamps provide more heat on the edges than at the centre of the substrate (12). A reflector (36) is configured as a distribution grid (38) designed to reflect the infrared radiation to control the power ratios between the different heating zones. Thus the substrate (12) is uniformly heated, whatever its shape and its dimensions.