| 摘要 |
An fusing apparatus for correcting process variation is provided. The fusing apparatus for correcting the process variation of the semiconductor device includes a fusing part including a fusing resistor fused by a current penetrating; a current driving transistor for fusing the fusing resistor by driving a fusing current according to a fusing enable signal applied; a current path part for building a current path by connecting to the fusing part, and controlling a first node voltage according to a fusing state of the fusing resistor; and a latch part for latching a second node signal inversely amplified from the first node voltage, and outputting the latch value when a power-on reset part operates in a normal mode. Using the fusing cell, the test time can be reduced and the current consumption can be greatly decreased in the fusing process.
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