| 发明名称 |
A LITHOGRAPHIC APPARATUS, AN ILLUMINATION SYSTEM, A PROJECTION SYSTEM AND A METHOD OF MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS |
| 摘要 |
<p>A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.</p> |
| 申请公布号 |
KR20110105731(A) |
申请公布日期 |
2011.09.27 |
| 申请号 |
KR20110024473 |
申请日期 |
2011.03.18 |
| 申请人 |
ASML NETHERLANDS B.V.;ASML HOLDING N.V. |
发明人 |
GOSEN JEROEN GERARD;VAN DER NET ANTONIUS JOHANNUS;PAARHUIS BART DINAND;VAN BOXTEL FRANK JOHANNES JACOBUS;LI JINGGAO |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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