发明名称 EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND LOCATION ADJUSTMENT METHOD FOR LIGHT FOCUSING OPTICAL MEANS
摘要 <p>Disclosed is an extreme ultraviolet light source device capable of adjusting the location of a light focusing mirror in order to achieve uniform angle distribution properties in a short period of time. Non-uniform angle distribution properties image data, and the movement direction and movement amount of the light focusing mirror required to adjust the non-uniform angle distribution properties to uniform angle distribution properties, are recorded in a distribution database (10a) in a controller (10). After obtaining the angle distribution image data from an angle distribution properties measurement apparatus (12), the angle distribution properties image data is compared to the images recorded in the distribution database (10a), and of the angle distribution properties image data, the image data is chosen that matches most closely with the obtained current angle distribution properties. Then, based on data retrieved for the movement direction and movement amount of the light focusing mirror (6) required for adjustment to the recorded uniform angle distribution properties that are associated with the chosen image data, the light focusing mirror (6) is moved by a light focusing mirror movement means (11).</p>
申请公布号 WO2011114889(A1) 申请公布日期 2011.09.22
申请号 WO2011JP54762 申请日期 2011.03.02
申请人 USHIO DENKI KABUSHIKI KAISHA;YAMATANI DAIKI 发明人 YAMATANI DAIKI
分类号 H01L21/027;G03F7/20;H05G2/00 主分类号 H01L21/027
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