| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve such a problem in a prior art that, after each scanning operation, the direction of mask scanning operation and the direction of substrate scanning operation are reversed and a substrate is moved even across the scanning direction, thus consuming a time. <P>SOLUTION: A lithography apparatus includes an illumination system. The illumination system is arranged to provide a first radiation beam forming a first mask illumination zone and at the same time, and to provide a second radiation beam forming a second mask illumination zone. The first and second mask illumination zones are arranged to illuminate the same mask at the same time. The lithography apparatus also includes a light projection system. The projection system projects the first radiation beam so as to form a first substrate illumination zone and at the same time, and projects the second radiation beam so as to form a second substrate illumination zone. <P>COPYRIGHT: (C)2011,JPO&INPIT |
