发明名称 GAS SUPPLY ELECTRODE AND METHOD OF CLEANING GAS SUPPLY ELECTRODE
摘要 PROBLEM TO BE SOLVED: To provide a gas supply electrode which is not corroded and, thereby, can prevent the diameter of gas supply holes from being changed and can prevent plasma formation from being made unstable when film deposition material deposited on the gas supply electrode made of aluminum is removed, and permits cleaning with chemicals, and to provide a method of cleaning the gas supply electrode. SOLUTION: The gas supply electrode includes a hollow casing made of aluminum and the plurality of gas supply holes 26a formed on a gas supply surface 20a of the casing, wherein a coating film having chemical resistance is formed on at least the gas supply surface and the surface of the gas supply holes. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011184774(A) 申请公布日期 2011.09.22
申请号 JP20100053407 申请日期 2010.03.10
申请人 FUJIFILM CORP 发明人 HASEGAWA MASATAKA;GOTO SHUN
分类号 C23C16/509;H01L21/31 主分类号 C23C16/509
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