发明名称 METHOD OF MANUFACTURING SUBSTRATE WITH TRANSPARENT ELECTRODE
摘要 PROBLEM TO BE SOLVED: To solve such a problem that in a conventional substrate with a transparent electrode, surface roughness depends on the substrate, the surface roughness on the ground layer or the transparent electrode layer formed thereon cannot be controlled, and therefore the control of unevenness of the order of micrometers or less cannot be performed and there is a limit for an optical design. SOLUTION: In the substrate with the transparent electrode, a part or whole of the layer including granular silicon oxide is used for the ground layer, the control of the nano-sized unevenness and the control of refraction index are possible, and the optical characteristic of the substrate with the transparent electrode can be largely improved as a result. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011183567(A) 申请公布日期 2011.09.22
申请号 JP20100048184 申请日期 2010.03.04
申请人 KANEKA CORP 发明人 FUJIMOTO TAKAHISA;UEDA TAKUAKI;KONDO KOZO;KUCHIYAMA TAKASHI;YAMAMOTO KENJI
分类号 B32B9/00;C23C14/10;H01B5/14;H01B13/00 主分类号 B32B9/00
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