发明名称 NONVOLATILE SEMICONDUCTOR MEMORY AND MANUFACTURING METHOD OF NONVOLATILE SEMICONDUCTOR MEMORY
摘要 According to one embodiment, a nonvolatile semiconductor memory includes word lines, bit lines, memory cells, a dummy word line, a dummy bit line and dummy cells. The word lines and the bit lines cross. The memory cells are provided for each intersection of the word lines and bit lines. Each memory cell includes a first diode and a resistance change memory element. The dummy word line crosses the bit lines. The dummy bit line crosses the word lines. The dummy cells are provided at each intersection of the dummy word line and the bit lines, and at each intersection of the dummy bit line and the word lines. Each dummy cell includes a second diode.
申请公布号 US2011228587(A1) 申请公布日期 2011.09.22
申请号 US201113047067 申请日期 2011.03.14
申请人 ITO HIROSHI 发明人 ITO HIROSHI
分类号 G11C11/00;H01L21/02 主分类号 G11C11/00
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