| 发明名称 |
APPARATUS FOR PROCESSING SUBSTRATE AND METHOD OF DOING THE SAME |
| 摘要 |
An apparatus for processing a substrate includes a gas-atmosphere applying unit for applying gas atmosphere to the substrate, and a light-exposure unit for exposing the substrate to light through a lower surface of the substrate. |
| 申请公布号 |
US2011229831(A1) |
申请公布日期 |
2011.09.22 |
| 申请号 |
US201113117928 |
申请日期 |
2011.05.27 |
| 申请人 |
NEC CORPORATION |
发明人 |
KIDO SHUSAKU |
| 分类号 |
G03F7/20;B05C9/12;B05C11/00;B05C13/00;B05D1/00;B05D3/04;B05D3/06;B05D3/10;B05D5/00;C09K13/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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