METHOD OF CLEANING ELECTRONIC MATERIAL AND CLEANING SYSTEM

摘要

The disclosed electronic material cleaning system is provided with a chemical cleaning means (1), a wet cleaning means (2), and a single wafer cleaning device (3). The chemical cleaning means (1) has: a functional chemical storage tank (6); and an electrolytic reaction device (8) that is connected to the functional chemical storage tank (6) via a concentrated sulfuric acid electrolytic line (7). The functional chemical storage tank (6) is able to supply a functional chemical (W1) to the single safer cleaning device (3) via a functional chemical supply line (10). The wet cleaning means (2) is provided with: a nitrogen gas supply line (22) that interconnects a purified water supply line (21) and a nitrogen gas source; and an internally mixing two-fluid nozzle (23) connected to each of the purified water supply line (21) and the nitrogen gas supply line (22). Droplets (W2) formed from nitrogen gas and purified water are able to be sprayed from the end of the two-fluid nozzle (23). As a result of this electronic material cleaning system, the time required for a resist-stripping treatment of an electronic material is shortened, and furthermore it is possible to reliably eliminate resist residue in a short period of time by means of wet cleaning after resist stripping.