发明名称 METHOD OF PATTERNING METAL ALLOY MATERIAL LAYER HAVING HAFNIUM AND MOLYBDENUM
摘要 A method of patterning a metal alloy material layer having hafnium and molybdenum. The method includes forming a patterned mask layer on a metal alloy material layer having hafnium and molybdenum on a substrate. The patterned mask layer is used as a mask and an etching process is performed using an etchant on the metal alloy material layer having hafnium and molybdenum so as to form a metal alloy layer having hafnium and molybdenum. The etchant includes at least nitric acid, hydrofluoric acid and sulfuric acid. The patterned mask layer is removed.
申请公布号 US2011226736(A1) 申请公布日期 2011.09.22
申请号 US201113118604 申请日期 2011.05.31
申请人 NANYA TECHNOLOGY CORPORATION 发明人 HUANG CHIH-WEI;LAI CHAO-SUNG;PENG HSING-KAN;LEE CHUNG-YUAN;LIN SHIAN-JYH
分类号 C23F1/02;C23F1/26 主分类号 C23F1/02
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