发明名称 |
METHOD OF PATTERNING METAL ALLOY MATERIAL LAYER HAVING HAFNIUM AND MOLYBDENUM |
摘要 |
A method of patterning a metal alloy material layer having hafnium and molybdenum. The method includes forming a patterned mask layer on a metal alloy material layer having hafnium and molybdenum on a substrate. The patterned mask layer is used as a mask and an etching process is performed using an etchant on the metal alloy material layer having hafnium and molybdenum so as to form a metal alloy layer having hafnium and molybdenum. The etchant includes at least nitric acid, hydrofluoric acid and sulfuric acid. The patterned mask layer is removed.
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申请公布号 |
US2011226736(A1) |
申请公布日期 |
2011.09.22 |
申请号 |
US201113118604 |
申请日期 |
2011.05.31 |
申请人 |
NANYA TECHNOLOGY CORPORATION |
发明人 |
HUANG CHIH-WEI;LAI CHAO-SUNG;PENG HSING-KAN;LEE CHUNG-YUAN;LIN SHIAN-JYH |
分类号 |
C23F1/02;C23F1/26 |
主分类号 |
C23F1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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