发明名称 FILM FORMING DEVICE, FILM FORMING METHOD, ROTATIONAL FREQUENCY OPTIMISATION METHOD, AND STORAGE MEDIUM
摘要 <p>Disclosed is a film forming device which can inhibit a drop in the in-plane uniformity of the film thickness of the film which is formed. The disclosed film forming device (2) which forms a film on an object to be treated (W), is provided with: a treatment container (4); gas supply means (28, 30) comprising gas jetting openings (34A, 36A) which emit jets of gas; a holding means (12) which holds the object to be treated in the treatment container; a drive mechanism (21) which rotates the holding means relative to the gas jetting openings or periodically moves the holding means in relation to said gas jetting openings; and a control means (48) which, when a cycle, wherein a supply period when at least one kind of gas is supplied and a supply-stop period when the gas supply is stopped are carried out once, is repeated a plurality of times, with the number of repetitions of the cycle being P (P being a natural number not less than 2), controls a gas supply initiation position, as seen from the centre of the object to be treated, for P times of each cycle, in a manner such that the position sequentially moves one part at a time in the circumferential direction of the object to be treated, said parts being the circumference once round the object to be treated divided by an arbitrary division number (K) (K=P) of units.</p>
申请公布号 WO2011115250(A1) 申请公布日期 2011.09.22
申请号 WO2011JP56546 申请日期 2011.03.18
申请人 TOKYO ELECTRON LIMITED;ITO SHOZO 发明人 ITO SHOZO
分类号 H01L21/31;C23C16/455 主分类号 H01L21/31
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