发明名称 SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
摘要 <P>PROBLEM TO BE SOLVED: To provide a resist composition having good resolution of a pattern obtained therefrom, and to provide a salt and an acid generator for obtaining the composition. <P>SOLUTION: There is provided a salt represented by formula (I) (wherein Q<SP>1</SP>and Q<SP>2</SP>are each independently fluorine or 1C-6C perfluoroalkyl; L<SP>1</SP>is divalent 1C-17C saturated hydrocarbon, and -CH<SB>2</SB>- included in the saturated hydrocarbon may be substituted by -O- or -CO-; and Z<SP>1+</SP>is an organic cation). There are also provided an acid generator including the salt, and a resist composition including the acid generator and a resin. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011184434(A) 申请公布日期 2011.09.22
申请号 JP20110024647 申请日期 2011.02.08
申请人 SUMITOMO CHEMICAL CO LTD 发明人 ICHIKAWA KOJI;OCHIAI MITSUYOSHI
分类号 C07C25/18;C07C381/12;C07D277/20;C07D277/36;C09K3/00;G03F7/004;G03F7/039 主分类号 C07C25/18
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