PLASMA PROCESSING DEVICE AND METHOD

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing device and a plasma processing method that assure stable electrostatic adsorption and prevent abnormal discharge resulting from increased plasma potential, using dipole-type J-R electrodes.

SOLUTION: In the plasma processing device having an electrostatic adsorption apparatus 2, that is provided with dipole-type J-R electrodes (inner side adsorption electrode 15; outer side adsorption electrode 16); a leakage current detecting meter 30 detects the leakage currents flowing from the inner side adsorption electrode 15 and the outer side adsorption electrode 16; and a control section 31 controls the voltage applied to the inner side adsorption electrode 15 and the outer side adsorption electrode 16, such that a difference of the detected leakage currents lies within a predetermined range.

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